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Advances in CMP/polishing technologi...

Doi, Toshiro.

Advances in CMP/polishing technologies for the manufacture of electronic devices

Record Type:	Electronic resources : Monograph/item
Title/Author:	Advances in CMP/polishing technologies for the manufacture of electronic devices/ edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.
other author:	Doi, Toshiro.
Published:	Oxford :William Andrew, : 2012.,
Description:	1 online resource (xii, 317 p.)
Notes:	Includes index.
Subject:	Electrolytic polishing. -
Online resource:	http://www.sciencedirect.com/science/book/9781437778595
ISBN:	9781437778595

Advances in CMP/polishing technologies for the manufacture of electronic devices
Advances in CMP/polishing technologies for the manufacture of electronic devices[electronic resource] /edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa. - 1st ed. - Oxford :William Andrew,2012. - 1 online resource (xii, 317 p.)

Includes index.

CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. This title presents the developments and technological innovations in the field - making R&D accessible to the wider engineering community.

ISBN: 9781437778595Subjects--Topical Terms:

257431
Electrolytic polishing.
Index Terms--Genre/Form:

96803
Electronic books.

LC Class. No.: TS670 / .A386 2012eb

Dewey Class. No.: 671.7/2

Advances in CMP/polishing technologies for the manufacture of electronic devices
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050 4 $a TS670 $b .A386 2012eb
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245 0 0 $a Advances in CMP/polishing technologies for the manufacture of electronic devices $h [electronic resource] / $c edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.
250 $a 1st ed.
260 $a Oxford : $c 2012. $b William Andrew,
300 $a 1 online resource (xii, 317 p.)
500 $a Includes index.
520 $a CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. This title presents the developments and technological innovations in the field - making R&D accessible to the wider engineering community.
650 0 $a Electrolytic polishing. $3 257431
650 0 $a Grinding and polishing. $3 229245
655 4 $a Electronic books. $2 local. $3 96803
700 1 $a Doi, Toshiro. $4 edt $3 257429
700 1 $a Marinescu, Ioan D. $4 edt $3 229375
700 1 $a Kurokawa, Syuhei. $4 edt $3 257430
856 4 0 $3 ScienceDirect $u http://www.sciencedirect.com/science/book/9781437778595
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